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标题: Physical Properties of an Ultrathin Al2O3/HfO2 Composite Film by Atomic Layer Deposition and the Application in Thin-Film Transistors
作者: Xu, Yachen; Chen, Huimin; Xu, Haiyang; Chen, Minyu; Zhou, Pengchao; Li, Shuzhe; Zhang, Ge; Shi, Wei; Yang, Xuyong; Ding, Xingwei; Wei, Bin
论文类型: 期刊论文
期刊/会议名称: ACS APPLIED MATERIALS & INTERFACES
年: 2023
卷: 15
期: 13