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10月24日学术报告

来源： 发布时间：2014-10-22【字体：大 中 小】

　　题目：Planarization of coating defects

　　姓名：Christopher J. Stolz

　　单位：Lawrence Livermore National Laboratory

　　时间：2014年10月24日（星期五） 上午9:30 

　　地点：溢智厅  

　　Abstract 　　  

Planarizing or smoothing over nodular defects in multilayer mirrors can be accomplished by a discrete deposit-and-etch process which exploits the angle-dependent etching rate of optical materials.  Typically, nodular defects limit the fluence on mirrors irradiated at 1064 nm with 10 ns pulse lengths due to geometrically- and interference-induced light intensification.  Planarized mirrors have successfully demonstrated >100 J/cm2 laser resistance for single shot testing and >40 J/cm2 for multi shot testing for nodular defects originating on the substrate surface. Two planarization methods were explored: thick planarization layers on the substrate surface; and planarized silica layers throughout the multilayer in which the etched silica layers are kept below a critical electric field.  This paper describes the impact of planarized absorbing defects that are buried within the multilayer structure. 　　  　　  　　  

　　Brief Biography:

Christopher Stolz has been in the laser program at Lawrence Livermore National Laboratory (LLNL) since 1989 researching high-power laser coatings.  He is currently responsible for the Optics Production group for the National Ignition Facility (NIF).  Chris has served as a co-chair or program chair for numerous conferences including Frontiers of Optical Coatings, Laser Induced Damage in Optical Materials (a.k.a. Boulder Damage Symposium) and Optical Interference Coatings.  He has coauthored over 90 journal and proceedings articles and 3 book chapters. 

 

　　                                                             所办公室

　　                                                            2014.10.22

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