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7月19日学术报告通知

来源： 发布时间：2012-07-18【字体：大 中 小】

题目：Modeling of defect inspection and detection and disposition using optical 　

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姓名：Andreas Erdmann

单位：Fraunhofer IISB, Germany

时间：2012年7月19日（周四）9:30

地点：溢智厅

Abstract：The investigation of the impact of defects in optical nanostructures like functional gratings, lithographic masks and other components on their performance is very important for many practical applications of optical nanotechnology. The talk will present the research plan of the CAS Guest professorship of A. Erdmann including first results. An algorithm was developed to retrieve the size, phase and transmission of a small object from the detected image. Methods from computational super-resolution were implemented and adapted for the detection of multiple sub-wavelength objects.

CV of Author：

Andreas Erdmann was born in Neustadt/Orla, Germany, in 1959. He received his PhD degree with specialization in applied optics from the Friedrich-Schiller-University of Jena, Germany, in 1988. In 1995 he joined the Fraunhofer Institute ISiT, where he started his activities in the field of lithography simulation. Since 1999 he is head of the Lithography Simulation Group in the semiconductor technology simulation department at Fraunhofer IISB. His fields of research include simulation of optical lithography, computational electrodynamics, microelectronic process technology and modern optics. Dr. Erdmann contributed to the development of several advanced lithography simulators including the Development and research LiTHOgraphy simulator Dr.LiTHO.

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2012年7月18日

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