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3月21日-4月16日光刻技术课程讲座通知

来源： 发布时间：2011-03-21【字体：大 中 小】

课程题目：光刻：技术、物理效应及建模；（Optical Lithography: Technology, Physical Effects, and Modeling）

讲座时间：3月21～4月16日每周一、周三、周五下午2：00至4：15

地　  点: 研究生公寓 505室（研究生第一教室）

课程主讲人：Dr. Andreas Erdmann

1999 起，德国弗劳恩霍夫集成系统与元器件技术研究所，（Fraunhofer-Institute for Integrated Systems and Device Technology (IISB)）研究员，研究组长；

2010 起，中国科学院外国专家特聘研究员.

Dr. Andreas Erdmann是光刻仿真研究领域的资深学者，有着十多年的极大规模集成电路制造光刻模型及算法的研究经历，研发并成功商业化光刻仿真软件Dr.LiTHO。研究领域主要涉及光学光刻、极紫外光刻、电子束光刻、接近接触式光刻中各种物理和化学效应的仿真。目前担任SPIE Advanced Lithography USA/Micro-and Nanoengineering Europe/ CLEO Europe/ SPIE Metrology Europe等多个国际会议组委会委员。

课程简介：

Semiconductor lithography covers the process of pattern transfer from a mask/layout to a photosensitive layer on the surface of a wafer. It is one of the most critical steps in the fabrication of microelectronic circuits. The majority of semiconductor chips are fabricated by optical projection lithography. Other lithographic techniques are used to fabricate lithographic masks or new optical and mechanical devices on the micro- or nanometer scale. Innovations such as the introduction of optical proximity correction (OPC), phase shift masks (PSM), special illumination techniques, chemical amplified resist (CAR) materials, immersion techniques have pushed the smallest feature sizes, which are produced by optical projection techniques, from several wavelengths in the early 80ties to less than a quarter of a wavelength nowadays. This course reviews different types of optical lithographies and compares them to other methods. The advantages, disadvantages, and limitations of lithographic methods are discussed from different perspectives. Important components of lithographic systems, such as masks, projection systems, and photoresist will be described in detail. Physical and chemical effects such as the light diffraction from small features on advanced photomasks, image formation in high numerical aperture systems, and coupled kinetic/diffusion processes in modern chemical amplified resists will be analysed. The course includes an in-depth introduction to lithography simulation which is used to devise and optimize modern lithographic processes.

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