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专业技术培训通知

来源: 发布时间:2010-03-23【字体:

培训专题:Lithography Simulation(光刻模拟)

(含process evaluation, lithography imaging, resolution enhancements, EUV lithography等,具体内容及日程以现场通知为准)

专家姓名:Andreas Erdmann(德)

专家单位:Fraunhofer Institute of Integrated Systems and Device Technology (IISB),弗劳恩霍夫集成系统与器件技术研究所

培训日期:3月25日(星期四)至3月28日(星期日)

课程时间:9:00-11:30、13:30-17:00

上课地点:研究生宿舍楼C303教室

本次技术培训由科研管理处和人事教育处联合举办,欢迎本所员工和学生参加!

      2010年3月23日

附:授课德国专家简介

Andreas Erdmann received his PhD degree with specialization in applied optics from the Friedrich-Schiller-University of Jena, Germany, in 1988. In 1995 he joined the Fraunhofer Institute ISiT, where he started his activities in the field of lithography simulation. Since 1999 he is head of the Lithography Simulation Group in the semiconductor technology simulation department at Fraunhofer IISB. His fields of research include simulation of optical and EUV lithography, computational electrodynamics, microelectronic process technology and modern optics. Dr. Erdmann contributed to the development of several advanced lithography simulators including the development and research lithography simulator Dr. LiTHO.


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